Corrigendum to ’Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films’[Acta Materialia 222 (2022) 117405] (Acta Materialia (2022) 222, (S1359645421007849), (10.1016/j.actamat.2021.117405))

Dong Hyun Lee, Geun Taek Yu, Ju Yong Park, Se Hyun Kim, Kun Yang, Geun Hyeong Park, Jin Ju Ryu, Je In Lee, Gun Hwan Kim, Min Hyuk Park

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