Corrigendum to ’Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films’[Acta Materialia 222 (2022) 117405] (Acta Materialia (2022) 222, (S1359645421007849), (10.1016/j.actamat.2021.117405))

Dong Hyun Lee, Geun Taek Yu, Ju Yong Park, Se Hyun Kim, Kun Yang, Geun Hyeong Park, Jin Ju Ryu, Je In Lee, Gun Hwan Kim, Min Hyuk Park

Research output: Contribution to journalComment/debatepeer-review

Abstract

The authors regret that the following information in the acknowledgments section was omitted: D. H. Lee was supported by BK21 FOUR Program by Pusan National University Research Grant, 2021. The authors would like to apologise for any inconvenience caused.

Original languageEnglish
Article number118732
JournalActa Materialia
Volume247
DOIs
Publication statusPublished - 2023 Apr 1

Bibliographical note

Publisher Copyright:
© 2023

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Polymers and Plastics
  • Metals and Alloys

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