Abstract
Ozonated water cleaning is an attractive process for the removal of photoresist in the manufacturing of semiconductor devices. To realize the benefits, a fundamental understanding of the mechanisms of ozone action is needed. This in turn will improve the processes in the current generation of ozone-based tools and will also lead to a broader range of tools and photoresist residues for which ozone chemistries can be effectively deployed.
| Original language | English |
|---|---|
| Pages (from-to) | 215-218 |
| Number of pages | 4 |
| Journal | Diffusion and Defect Data Pt.B: Solid State Phenomena |
| Volume | 76-77 |
| Publication status | Published - 2000 |
| Event | 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: 2000 Sept 18 → 2000 Sept 20 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Materials Science(all)
- Condensed Matter Physics
- Physics and Astronomy (miscellaneous)