Control of ozonated water cleaning process for photoresist removal

Sang Woo Lim, Christopher E.D. Chidsey

Research output: Contribution to journalConference articlepeer-review


Ozonated water cleaning is an attractive process for the removal of photoresist in the manufacturing of semiconductor devices. To realize the benefits, a fundamental understanding of the mechanisms of ozone action is needed. This in turn will improve the processes in the current generation of ozone-based tools and will also lead to a broader range of tools and photoresist residues for which ozone chemistries can be effectively deployed.

Original languageEnglish
Pages (from-to)215-218
Number of pages4
JournalDiffusion and Defect Data Pt.B: Solid State Phenomena
Publication statusPublished - 2000
Event5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium
Duration: 2000 Sept 182000 Sept 20

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics
  • Physics and Astronomy (miscellaneous)


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