TY - JOUR
T1 - Contact Effect of ReS2/Metal Interface
AU - Park, Jae Young
AU - Joe, Hang Eun
AU - Yoon, Hyong Seo
AU - Yoo, Sanghyuk
AU - Kim, Taekyeong
AU - Kang, Keonwook
AU - Min, Byung Kwon
AU - Jun, Seong Chan
N1 - Publisher Copyright:
© 2017 American Chemical Society.
PY - 2017/8/9
Y1 - 2017/8/9
N2 - Rhenium disulfide (ReS2) has attracted immense interest as a promising two-dimensional material for optoelectronic devices owing to its outstanding photonic response based on its energy band gap's insensitivity to the layer thickness. Here, we theoretically calculated the electrical band structure of mono-, bi-, and trilayer ReS2 and experimentally found the work function to be 4.8 eV, which was shown to be independent of the layer thickness. We also evaluated the contact resistance of a ReS2 field-effect transistor using a Y-function method with various metal electrodes, including graphene. The ReS2 channel is a strong n-type semiconductor, thus a lower work function than that of metals tends to lead to a lower contact resistance. Moreover, the graphene electrodes, which were not chemically or physically bonded to ReS2, showed the lowest contact resistance, regardless of the work function, suggesting a significant Fermi-level pinning effect at the ReS2/metal interface. In addition, an asymmetric Schottky diode device was demonstrated using Ti or graphene for ohmic contacts and Pt or Pd for Schottky contacts. The ReS2-based transistor used in this study on the work function of ReS2 achieved the possibility of designing the next-generation nanologic devices.
AB - Rhenium disulfide (ReS2) has attracted immense interest as a promising two-dimensional material for optoelectronic devices owing to its outstanding photonic response based on its energy band gap's insensitivity to the layer thickness. Here, we theoretically calculated the electrical band structure of mono-, bi-, and trilayer ReS2 and experimentally found the work function to be 4.8 eV, which was shown to be independent of the layer thickness. We also evaluated the contact resistance of a ReS2 field-effect transistor using a Y-function method with various metal electrodes, including graphene. The ReS2 channel is a strong n-type semiconductor, thus a lower work function than that of metals tends to lead to a lower contact resistance. Moreover, the graphene electrodes, which were not chemically or physically bonded to ReS2, showed the lowest contact resistance, regardless of the work function, suggesting a significant Fermi-level pinning effect at the ReS2/metal interface. In addition, an asymmetric Schottky diode device was demonstrated using Ti or graphene for ohmic contacts and Pt or Pd for Schottky contacts. The ReS2-based transistor used in this study on the work function of ReS2 achieved the possibility of designing the next-generation nanologic devices.
KW - Kelvin probe force microscopy
KW - ReS
KW - Schottky diode
KW - TMDc
KW - contact resistance
KW - density functional theory
KW - field-effect transistor
KW - rhenium disulfide
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U2 - 10.1021/acsami.7b06432
DO - 10.1021/acsami.7b06432
M3 - Article
C2 - 28718280
AN - SCOPUS:85027278352
SN - 1944-8244
VL - 9
SP - 26325
EP - 26332
JO - ACS Applied Materials and Interfaces
JF - ACS Applied Materials and Interfaces
IS - 31
ER -