Complementary Type Ferroelectric Memory Transistor Circuits with P- and N-Channel MoTe₂

Ferroelectric nonvolatile memory (FeNVM) field effect transistors (FETs) are reported using p-channel MoTe₂ and P(VDF-TrFE) ferroelectric polymer, and furthermore a complementary type memory cell is demonstrated coupling p- and n-channel MoTe₂ FETs. A top-gate p-FET with P(VDF-TrFE) and a bottom-gate n-FET with Al₂O₃ dielectric are integrated as one cell. Such a complementary type cell is more desirable research path in respect of power consumption but rare to find in 2D-based memory reports. Among many 2D semiconductors MoTe₂ is selected, because p-type MoTe₂-based FeNVM is not reported yet, and also because it is relatively easy to obtain both p- and n-channel from the homogeneous MoTe₂. The integrated device also operates as a complementary metal oxide semiconductor inverter in a small voltage range from 0 to ≈2.5 V, but primarily works as a FeNVM circuit when p-channel with top P(VDF-TrFE) is biased with high voltages over the coercive electric field (E_c) of the polymer. The bottom gate n-channel transistor operates as a switching device in the FeNVM cell, allowing voltage output signals during device operations. It is concluded that the complementary type FeNVM cell is practical and novel enough to report as a first time demonstration based on 2D MoTe₂.