Abstract
The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.
Original language | English |
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Pages (from-to) | 2394-2399 |
Number of pages | 6 |
Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Volume | 18 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2000 Sept |
Event | 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: 2000 Oct 2 → 2000 Oct 6 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films