Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

Sang Hyuck Bae; Sang Yeol Lee; Hyun Young Kim; Seongil Im

doi:10.1016/S0169-4332(00)00781-9

Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

Sang Hyuck Bae, Sang Yeol Lee, Hyun Young Kim, Seongil Im

Department of Physics

Research output: Contribution to journal › Article › peer-review

39 Citations (Scopus)

Abstract

Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

Original language	English
Pages (from-to)	332-334
Number of pages	3
Journal	Applied Surface Science
Volume	168
Issue number	1-4
DOIs	https://doi.org/10.1016/S0169-4332(00)00781-9
Publication status	Published - 2000 Dec 15

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/S0169-4332(00)00781-9

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abstract = "Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).",

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AU - Bae, Sang Hyuck

AU - Lee, Sang Yeol

AU - Kim, Hyun Young

AU - Im, Seongil

PY - 2000/12/15

Y1 - 2000/12/15

N2 - Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

AB - Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

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Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

Abstract

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