Comparative analysis of serial and parallel laser patterning of Ag nanowire thin films

Ag nanowire (AgNW) films solution-coated on a glass substrate were laser-patterned in two different ways. For the conventional serial process, a pulsed ultraviolet laser of 30 kHz repetition rate and ∼20 ns pulse width was employed as the laser source. For parallel patterning, the film was directly irradiated by a spatially-modulated Nd:YAG laser beam that has a low repetition rate of 10 kHz and a shorter pulse width of 5 ns. While multiple pulses with energy density ranging from 3 to 9 J/cm ² were required to pattern the film in the serial process, a single pulse with energy density of 0.16 J/cm ² completely removed AgNWs in the parallel patterning. This may be explained by the difference in patterning mechanism. In the parallel process using short pulses of 5 ns width, AgNWs can be removed in their solid state by the laser-induced thermo-elastic force, while they should be evaporated in the serial process utilizing a high-repetition rate laser.