Chemical reaction at the interface between pentacene and HfO2

S. J. Kang, Y. Yi, C. Y. Kim, K. H. Yoo, A. Moewes, M. H. Cho, J. D. Denlinger, C. N. Whang, G. S. Chang

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


The electronic structure and the interface formation at the interface region between pentacene and HfO2 are investigated using x-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and x-ray emission spectroscopy (XES). The measured C 1s XPS spectra of pentacene indicate that chemical bonding occurs at the interface between pentacene and HfO2. The carbon of pentacene reacts with oxygen belonging to HfO2 and band bending occurs at the interface due to a redistribution of charge. The determined interface dipole and band bending between pentacene and HfO2 are 0.04 and 0.1eV, respectively. The highest occupied molecular orbital (HOMO) level is observed at 0.68eV below the Fermi level. This chemical reaction allows us to grow a pentacene film with large grains onto HfO2. We conclude that high performance pentacene thin film transistors can be obtained by inserting an ultrathin HfO2 layer between pentacene and a gate insulator.

Original languageEnglish
Article number205328
JournalPhysical Review B - Condensed Matter and Materials Physics
Issue number20
Publication statusPublished - 2005 Nov 15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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