Characterization of poly-Si TFT array on plastic substrate for AMOLED

Jang Yeon Kwon; Do Young Kim; Ji Sim Jung; Jong Man Kim; Hyuck Lim; Kyung Bae Park; Hans S. Cho; Xiaoxin Zhang; Huaxiang Yin; Wenyu Xianyu; Takashi Noguchi

Characterization of poly-Si TFT array on plastic substrate for AMOLED

Jang Yeon Kwon, Do Young Kim, Ji Sim Jung, Jong Man Kim, Hyuck Lim, Kyung Bae Park, Hans S. Cho, Xiaoxin Zhang, Huaxiang Yin, Wenyu Xianyu, Takashi Noguchi

School of Integrated Technology

Research output: Contribution to conference › Paper › peer-review

1 Citation (Scopus)

Abstract

We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films and gate insulator by using inductively coupled plasma CVD. In addition, stability and uniformity of TFT array between before and after sintering will be compared.

Original language	English
Pages	1133-1135
Number of pages	3
Publication status	Published - 2005
Event	IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005 - Takamatsu, Japan Duration: 2005 Dec 6 → 2005 Dec 9

Other

Other	IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005
Country/Territory	Japan
City	Takamatsu
Period	05/12/6 → 05/12/9

All Science Journal Classification (ASJC) codes

Engineering(all)

Cite this

@conference{d45a64a7f1f74a6786e10ca0af682173,

title = "Characterization of poly-Si TFT array on plastic substrate for AMOLED",

abstract = "We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films and gate insulator by using inductively coupled plasma CVD. In addition, stability and uniformity of TFT array between before and after sintering will be compared.",

author = "Kwon, {Jang Yeon} and Kim, {Do Young} and Jung, {Ji Sim} and Kim, {Jong Man} and Hyuck Lim and Park, {Kyung Bae} and Cho, {Hans S.} and Xiaoxin Zhang and Huaxiang Yin and Wenyu Xianyu and Takashi Noguchi",

year = "2005",

language = "English",

pages = "1133--1135",

note = "IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005 ; Conference date: 06-12-2005 Through 09-12-2005",

}

TY - CONF

T1 - Characterization of poly-Si TFT array on plastic substrate for AMOLED

AU - Kwon, Jang Yeon

AU - Kim, Do Young

AU - Jung, Ji Sim

AU - Kim, Jong Man

AU - Lim, Hyuck

AU - Park, Kyung Bae

AU - Cho, Hans S.

AU - Zhang, Xiaoxin

AU - Yin, Huaxiang

AU - Xianyu, Wenyu

AU - Noguchi, Takashi

PY - 2005

Y1 - 2005

N2 - We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films and gate insulator by using inductively coupled plasma CVD. In addition, stability and uniformity of TFT array between before and after sintering will be compared.

AB - We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films and gate insulator by using inductively coupled plasma CVD. In addition, stability and uniformity of TFT array between before and after sintering will be compared.

UR - http://www.scopus.com/inward/record.url?scp=33644597931&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33644597931&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:33644597931

SP - 1133

EP - 1135

T2 - IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005

Y2 - 6 December 2005 through 9 December 2005

ER -

Characterization of poly-Si TFT array on plastic substrate for AMOLED

Abstract

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All Science Journal Classification (ASJC) codes

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