Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Sung Jin Jo; Chang Su Kim; Seung Yoon Ryu; Jong Bok Kim; Joo Hyon Noh; Se Jong Lee; Hong Koo Baik

doi:10.1143/JJAP.46.6814

Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Sung Jin Jo, Chang Su Kim, Seung Yoon Ryu, Jong Bok Kim, Joo Hyon Noh, Se Jong Lee, Hong Koo Baik

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

The CF₄ plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

Original language	English
Pages (from-to)	6814-6816
Number of pages	3
Journal	Japanese Journal of Applied Physics
Volume	46
Issue number	10 A
DOIs	https://doi.org/10.1143/JJAP.46.6814
Publication status	Published - 2007 Oct 9

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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title = "Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy",

abstract = "The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.",

author = "Jo, {Sung Jin} and Kim, {Chang Su} and Ryu, {Seung Yoon} and Kim, {Jong Bok} and Noh, {Joo Hyon} and Lee, {Se Jong} and Baik, {Hong Koo}",

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doi = "10.1143/JJAP.46.6814",

language = "English",

volume = "46",

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T1 - Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

AU - Jo, Sung Jin

AU - Kim, Chang Su

AU - Ryu, Seung Yoon

AU - Kim, Jong Bok

AU - Noh, Joo Hyon

AU - Lee, Se Jong

AU - Baik, Hong Koo

PY - 2007/10/9

Y1 - 2007/10/9

N2 - The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

AB - The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

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DO - 10.1143/JJAP.46.6814

M3 - Article

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JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 10 A

ER -

Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Abstract

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