Characterization and light-emitting properties of Au/SiOx/p-Si and Au/Ni-implanted-SiOx/p-Si structures

H. S. Bae, W. S. Lee, T. G. Kim, C. N. Whang, J. H. Song, S. Im

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4 Citations (Scopus)


SiOx layers were fabricated by thermal evaporation of SiO powders onto p-type Si(100) substrates at 200°C to investigate the electrical and light-emitting properties of the layers. After deposition, Ni ions of 70 keV were also implanted into SiOx layers at room temperature. Then both of the as-deposited and as-implanted samples were annealed in N2 ambient for 2 h at 500°C. Violet photoluminescence (PL) due to radiative defects was observed from all the SiOx samples but annealed ones showed more intense PL than unannealed samples. Red electroluminescence (EL) was obtained from the SiOx in metal-insulator-semiconductor (MIS) structures and the annealed SiOx layers also exhibit more intense EL than unannealed layers. Particularly, the SiOx annealed after Ni-implantation showed the most intense EL which may be caused by highly concentrated radiative defects in the implanted SiOx.

Original languageEnglish
Pages (from-to)485-489
Number of pages5
JournalThin Solid Films
Publication statusPublished - 2001 Nov

Bibliographical note

Funding Information:
This work was supported in part by the BK 21 program, the Korea Science and Engineering Foundation (KOSEF) through the ASSRC at Yonsei University, and the grants from KOSEF (1999-2-114-004-5).

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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