Abstract
Using a simple theoretical model, we calculated three-dimensional profiles of photoresists that were exposed by arbitrarily-shaped localized fields of high-transmission metal nano-apertures. We applied the finite-difference time-domain (FDTD) method to obtain the localized field distributions. These distributions are generated by excitation of localized surface plasmon polaritons underneath a circular, C-shaped or bowtie-shaped aperture. We predicted the two-dimensional exposure profiles of the photoresist as a function of the photoresist contrast when the results of the FDTD simulations were applied to the theoretical model. The three-dimensional exposure profiles of the photoresist were also visualized as a function of the exposure dose and the gap distance between the aperture and the photoresist. The three-dimensional exposure profiles provided useful information in determining the process parameters for nano-patterning by plasmonic lithography using the high-transmission nano-aperture.
| Original language | English |
|---|---|
| Article number | 71401J |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 7140 |
| DOIs | |
| Publication status | Published - 2008 |
| Event | Lithography Asia 2008 - Taipei, Taiwan, Province of China Duration: 2008 Nov 4 → 2008 Nov 6 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering