Beam alignment for scanning beam interference lithography

Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Paul T. Konkola, G. S. Pati, Mark L. Schattenburg

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


A system for carrying out automated beam alignment for scanning beam interference lithography (SBIL) was described. A mathematical formalism was developed to describe the iterative beam alignment principle, which can be used to guide the design of such systems. Repeatability experiments show that the system can align the mean beam angle and position to tolerances of ≪10 μrad and ∼10 μm. This fulfills the alignment requirements for nanometer-level SBIL writing.

Original languageEnglish
Pages (from-to)3071-3074
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - 2002 Nov

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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