Atomic structure of Ba layer on Si(0 0 1)-(2×1) surface studied by low energy ion scattering

W. S. Cho, J. Y. Kim, S. S. Kim, D. S. Choi, K. Jeong, I. W. Lyo, C. N. Whang, K. H. Chae

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1 Citation (Scopus)

Abstract

The atomic structure of Ba layer on Si(0 0 1)-(2×1) surface is investigated by coaxial impact collision ion scattering spectroscopy. When 0.7 ML of Ba atoms are adsorbed on Si(0 0 1) at room temperature, the first preferential site of adsorption is T3 site with a height of 3.00±0.05 angstroms from the second layer of Si(0 0 1) even though the periodicity is poor. The next favorable site is HH site with a height of 3.50±0.05 angstroms from the second layer of Si(0 0 1).

Original languageEnglish
Pages (from-to)L259-L266
JournalSurface Science
Volume476
Issue number3
DOIs
Publication statusPublished - 2001 Apr 1

Bibliographical note

Funding Information:
Authors thanks to T.N. Wittberg at University of Dayton for donation of Ba dispenser. This work was supported by the Korea Science and Engineering Foundation (KOSEF) through the Atomic-scale Surface Science Research Center (ASSRC) at Yonsei University.

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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