Abstract
Among chalcogenides for phase-change memory, Sb2Te3 is attracting attention for its huge potential, along with recent demands for atomic layer deposition (ALD). We aimed to study atomic-scale thin film growth and phase transformation of ALD Sb2Te3 thin films with substrate dependency. Comparatively, thin film growth trends of ALD Sb2Te3 on SiO2 and W substrate were studied by observing transformation of crystal structures, and trends in electrical resistivity. On SiO2, predominant amorphous phases at initial stage were observed, followed by polycrystalline island growth with randomly oriented grains. However, on crystalline W, the highly out-of-plane (00l) orientations and layer-by-layer growth was found.
Original language | English |
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Title of host publication | 2023 IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference, IITC/MAM 2023 - Proceedings |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 9798350310979 |
DOIs | |
Publication status | Published - 2023 |
Event | 2023 IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference, IITC/MAM 2023 - Dresden, Germany Duration: 2023 May 22 → 2023 May 25 |
Publication series
Name | 2023 IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference, IITC/MAM 2023 - Proceedings |
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Conference
Conference | 2023 IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference, IITC/MAM 2023 |
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Country/Territory | Germany |
City | Dresden |
Period | 23/5/22 → 23/5/25 |
Bibliographical note
Publisher Copyright:© 2023 IEEE.
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films