Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

H. Kim

doi:10.1116/1.1622676

Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

H. Kim

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

535 Citations (Scopus)

Original language	English
Pages (from-to)	2231-2261
Number of pages	31
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1622676
Publication status	Published - 2003

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1116/1.1622676

Cite this

@article{29bc04429b8847f99d80d33d382bcd50,

title = "Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing",

author = "H. Kim",

year = "2003",

doi = "10.1116/1.1622676",

language = "English",

volume = "21",

pages = "2231--2261",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Atomic layer deposition of metal and nitride thin films

T2 - Current research efforts and applications for semiconductor device processing

AU - Kim, H.

PY - 2003

Y1 - 2003

UR - http://www.scopus.com/inward/record.url?scp=0942267575&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0942267575&partnerID=8YFLogxK

U2 - 10.1116/1.1622676

DO - 10.1116/1.1622676

M3 - Article

AN - SCOPUS:0942267575

SN - 1071-1023

VL - 21

SP - 2231

EP - 2261

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Cite this