@inproceedings{f91010f51d3947e58b391cda7c96c0f1,
title = "Application of solid immersion lens based near-field recording technology to high speed nano patterning",
abstract = "In this paper, we present a low-cost and high-throughput approach to maskless nanolithography that uses a plasmonic solid immersion lens (SIL) optical head which consists of a SIL and a sharp-ridge nanoaperture for a high strong nanometer-size optical spot. According to the use of the evanescent field generated from SIL for near-field active air-gap control, the plasmonic SIL can fly ~20 nm above a photoresist-coated Si-wafer that moves at speed of 0 ~ 200 mm/s and perform the line patterning with nanometer-size width. We have experimentally demonstrated patterning with a line width (full width at half magnitude: FWHM) of ~130 nm.",
author = "Park, {No Cheol} and Min, {Byung Kwon} and Park, {Young Pil} and Hyunseok Yang and Park, {Kyoung Su} and Kang, {Sung Mook}",
year = "2011",
language = "English",
isbn = "9781557529152",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of American (OSA)",
booktitle = "Joint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011",
note = "Joint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011 ; Conference date: 17-07-2011 Through 20-07-2011",
}