The physical and electrical characteristics of Al silicate film were studied depending on the annealing temperature. The structure of the film was changed from amorphous to crystalline structure as postannealing temperature increases. The interfacial layer thickness and the stoichiometry at the interfacial region significantly influenced the electrical properties such as trap charge densities and conduction process.
|Number of pages||8|
|Journal||Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films|
|Publication status||Published - 2002|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films