Achieving 1-nm-Scale Equivalent Oxide Thickness Top-Gate Dielectric on Monolayer Transition Metal Dichalcogenide Transistors with CMOS-Friendly Approaches

Jung Soo Ko, Alexander B. Shearer, Sol Lee, Kathryn Neilson, Marc Jaikissoon, Kwanpyo Kim, Stacey F. Bent, Eric Pop, Krishna C. Saraswat

Research output: Contribution to journal › Article › peer-review

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