Abstract
The electrical property of direct-patternable SnO 2 thin film was improved by the incorporation of graphene. Graphene were incorporated into SnO 2 photosensitive solution and the direct-patternable film was prepared by photochemical solution deposition. The incorporation of graphene into SnO 2 films slightly reduced the transmittance of the films due to light scattering by the incorporated graphene. In addition, with incorporation of graphene, the crystallinity of the SnO 2 thin films was decreased slightly and the resistivity was improved due to an enhancement of mobility because of the π-bond nature of surface on graphene. Direct-patterning of graphene incorporated SnO 2 thin films was performed without photoresist or etching process. These results suggest that a micropatterned system can be simply fabricated at a low cost and the electrical properties of SnO 2 films can be improved by incorporating graphene.
Original language | English |
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Pages (from-to) | 1869-1872 |
Number of pages | 4 |
Journal | Physica Status Solidi (A) Applications and Materials Science |
Volume | 208 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2011 Aug |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry