A study of the image quality in a lossy NFSL

Kwangchil Lee, Kyoungsik Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Recently, the near-field superlens (NFSL) based on the negative permittivity (ε < 0) has been much attraction issue because of its useful application in a near-field imaging system beyond the diffraction limits. Silver in the UV region and silicon carbide in the mid-IR regime has been reported as suitable materials for the NFSL. However, these materials have the intrinsic absorption loss, which blurs the near-field image. In this research, we theoretically predict enhancement of image quality in a lossy NFSL system using the full-wave numerical approach and electrostatic approximation method. As a result, we recognized that an unmatched NFSL has better image quality compared to the traditional match NFSL.

Original languageEnglish
Title of host publicationMetamaterials
Subtitle of host publicationFundamentals and Applications II
Publication statusPublished - 2009
EventMetamaterials: Fundamentals and Applications II - San Diego, CA, United States
Duration: 2009 Aug 22009 Aug 5

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherMetamaterials: Fundamentals and Applications II
Country/TerritoryUnited States
CitySan Diego, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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