A direct-patternable ZnO thin film was prepared by photochemical solution deposition and the electrical properties were improved by the incorporation of graphene. The transmittance of graphene-incorporated ZnO thin films was similar to that of ZnO thin film due to the incorporation of graphene, which slightly decreased the crystallinity of the ZnO thin films. In addition, the resistivity was improved due to the enhanced mobility due to the π-bond nature of the graphene surface. Graphene-incorporated ZnO thin film was direct-patterned through photochemical solution deposition without a photoresist or conventional dry etching process. These results suggest that a micro-patterned system can be simply fabricated at low cost, and the electrical properties of ZnO thin films can be improved by incorporating graphene.
Bibliographical noteFunding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2012R1A2A2A01011014 ) and by Business for Technology Innovation & Development funded by Korea Small and Medium Business Administration (Grants No. S2043273 ).
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry