A run-to-run controller for a chemical mechanical planarization process using least squares generative adversarial networks

Computer Science

• Input Distribution 100%
• Process Variation 80%
• Simulation Mode 60%
• Least Squares Methods 40%
• Generative Adversarial Networks 40%
• Control 40%
• Convolutional Layer 20%
• Computation Time 20%
• Extracted Feature 20%
• Process Quality 20%
• Deep Learning 20%
• Networks 20%
• Accuracy 20%