Abstract
For application of PRAM to IoT devices, it is necessary to reduce write energy consumption of PRAM. In a sub-20nm PRAM technology, the optimization of heater material and structure was performed with the Sentaurus TCAD simulator, which notices that the TiN is more preferred than the Poly Si or W and the wall structure has better write energy efficiency than the confined structure. In addition, a novel heat-aware write method (HAW) is proposed, which controls the write current and voltage considering with the heat generated by the heater. With the HSPICE simulation using 0.25- μ m industry-compatible model, PRAM cell achieves the write energy improvement by 22%, 19%, and 36% in the case of the wall structure with TiN, the proposed HAW, and both, respectively.
Original language | English |
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Title of host publication | 2018 25th IEEE International Conference on Electronics Circuits and Systems, ICECS 2018 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 273-276 |
Number of pages | 4 |
ISBN (Electronic) | 9781538695623 |
DOIs | |
Publication status | Published - 2018 Jul 2 |
Event | 25th IEEE International Conference on Electronics Circuits and Systems, ICECS 2018 - Bordeaux, France Duration: 2018 Dec 9 → 2018 Dec 12 |
Publication series
Name | 2018 25th IEEE International Conference on Electronics Circuits and Systems, ICECS 2018 |
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Conference
Conference | 25th IEEE International Conference on Electronics Circuits and Systems, ICECS 2018 |
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Country/Territory | France |
City | Bordeaux |
Period | 18/12/9 → 18/12/12 |
Bibliographical note
Publisher Copyright:© 2018 IEEE.
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Instrumentation