A fine-ordered nanostructured bismuth tin oxide thin film constructed via sol–gel nanopatterning for liquid crystal system

Dong Wook Lee, Dong Hyun Kim, Jin Young Oh, Dae Shik Seo

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Nanoimprint lithography is a very convenient and cost-effective method, and when combined with a sol–gel process, can be used to simply accomplish the nanopatterning of a bismuth tin oxide (BTO) film. We achieved the transfer of a nanostructure to a solution-driven BTO film by using nanoimprint lithography for utilization as a liquid crystal (LC) alignment layer. A curing temperature of 250 ℃ was ideal for the transfer of the nanopattern from polydimethylsiloxane to a BTO film, as confirmed by using atomic force microscopy, scanning electron microscopy, and x-ray photoelectron spectroscopy. The nanopattern led to the uniform alignment of LC molecules, as confirmed via polarized optical microscopy and pretilt angle analysis. In addition, the nanopattern-imprinted BTO film showed great potential for LC applications due to its high thermal stability and optical transmittance, along with super-fast switching and low voltage operating electro-optical characteristics. Sol–gel nanopatterning of metal oxides is a convenient process to create LC-alignment films for application in diverse electro-optical devices.

Original languageEnglish
Article number109
JournalApplied Physics A: Materials Science and Processing
Volume128
Issue number2
DOIs
Publication statusPublished - 2022 Feb

Bibliographical note

Publisher Copyright:
© 2022, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature.

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • General Materials Science

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