2D MoSe2 Transistor with Polymer-Brush/Channel Interface

Yeonsu Jeong, Ji Hoon Park, Jongtae Ahn, June Yeong Lim, Eunkyoung Kim, Seongil Im

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)


Toward any practical applications of 2D transition metal dichalcogenide (TMD) transistors, two issues are often met. First, threshold voltage (Vth) of usual TMD 2D field effect transistors (FETs) is located quite away from 0 V, making the device already on and less practical. Second, a large hysteresis exists during transistor operation. Here, hysteresis-minimized n-TMD FETs are fabricated using polymer-brush/channel interface, to extend the 2D FET study to a sensor application. Gated by piezoelectric P(VDF-TrFE) touch pad that allows dipole switching and instantaneous voltages of +5 and -5 V, n-MoSe2 FET operates well in its ON/OFF drain current behavior, due to its properly small Vth of −5 V. However, n-MoS2 FET with a relatively high Vth of more than −8 V cannot be suitably switched off. To minimize the gate hysteresis, ultrathin polystyrene-brush layer is applied between TMD channel and 50 nm thin Al2O3 dielectric. n-Channel MoS2 and MoSe2 FETs exhibit a minimum voltage hysteresis of 1 and 0.5 V, respectively. It is regarded that Vth and hysteresis issues are uneasy to resolve but still possible to circumvent by using proper TMD channel and channel/dielectric interface materials.

Original languageEnglish
Article number1800812
JournalAdvanced Materials Interfaces
Issue number19
Publication statusPublished - 2018 Oct 9

Bibliographical note

Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering


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